{"title":"A Materials Screening Methodology for Scaled Non-Volatile Memory in the AI Era","authors":"N. Lanzillo, R. Robison","doi":"10.1109/ans47466.2019.8963744","DOIUrl":null,"url":null,"abstract":"We demonstrate a simulation workflow based on first-principles calculations to rapidly screen candidate materials for viability as ferromagnetic electrodes in magnetic tunnel junctions (MTJs) for the next generation of high-performance magnetic random access memory (MRAM) technology. For a series of Fe-based alloys with a fixed crystal structure, we calculate formation energies, bulk spin polarization, and essential magnetic properties including magnetic anisotropy energy (MAE) and tunneling magnetoresistance (TMR). This work demonstrates a materials optimization strategy that can guide on-wafer experiments","PeriodicalId":375888,"journal":{"name":"2019 IEEE Albany Nanotechnology Symposium (ANS)","volume":"63 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 IEEE Albany Nanotechnology Symposium (ANS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ans47466.2019.8963744","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We demonstrate a simulation workflow based on first-principles calculations to rapidly screen candidate materials for viability as ferromagnetic electrodes in magnetic tunnel junctions (MTJs) for the next generation of high-performance magnetic random access memory (MRAM) technology. For a series of Fe-based alloys with a fixed crystal structure, we calculate formation energies, bulk spin polarization, and essential magnetic properties including magnetic anisotropy energy (MAE) and tunneling magnetoresistance (TMR). This work demonstrates a materials optimization strategy that can guide on-wafer experiments