T. Suzuki, H. Yamauchi, Y. Yamagami, K. Satomi, H. Akamatsu
{"title":"A Stable SRAM Cell Design Against Simultaneously R/W Disturbed Accesses","authors":"T. Suzuki, H. Yamauchi, Y. Yamagami, K. Satomi, H. Akamatsu","doi":"10.1109/VLSIC.2006.1705287","DOIUrl":null,"url":null,"abstract":"A guarantee obligation of keeping the cell-margin against a simultaneously read and write (R/W) disturbed accesses in the same column is required to a 2-port SRAM. We verified that it is difficult to provide these margins without any decrease in cell-current and any increase in cell-area penalty only by using the previously proposed techniques so far. To solve this, we have developed the new cell design technology for an 8-Tr 2-port cell in a 65-nm CMOS technology and have demonstrated that the R/W margins can be improved by 45%/70%, respectively at 0.9V, and the cell-size can be reduced by 20% compared with the conventional column-based Vdd control. Another 7-Tr cell which can reduce cell-area by 31% has been also demonstrated","PeriodicalId":366835,"journal":{"name":"2006 Symposium on VLSI Circuits, 2006. Digest of Technical Papers.","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-06-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"25","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 Symposium on VLSI Circuits, 2006. Digest of Technical Papers.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIC.2006.1705287","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 25
Abstract
A guarantee obligation of keeping the cell-margin against a simultaneously read and write (R/W) disturbed accesses in the same column is required to a 2-port SRAM. We verified that it is difficult to provide these margins without any decrease in cell-current and any increase in cell-area penalty only by using the previously proposed techniques so far. To solve this, we have developed the new cell design technology for an 8-Tr 2-port cell in a 65-nm CMOS technology and have demonstrated that the R/W margins can be improved by 45%/70%, respectively at 0.9V, and the cell-size can be reduced by 20% compared with the conventional column-based Vdd control. Another 7-Tr cell which can reduce cell-area by 31% has been also demonstrated