Devices for high performance computing beyond 14nm node - is there anything other than Si?

W. Haensch
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引用次数: 2

Abstract

A scaling path for Si based technology seems possible to the 8nm node. Power limitation will force to reduce the supply voltage at the expense of device performance and susceptibility to process variations. A lower limit of Vdd=0.5V seems feasible. Parallelism on system level will provide system through put which stresses architecture and software development. In particular legacy code will be a problem for a transition period that might require dual supply multi core architectures. In this scenario device technology has to cater to both high voltage and low voltage operation. Beyond the 8nm node new device concepts are needed. Considering the time frame of a 2019 manufacturing for this node a device has to be demonstrated now. At this point CNTs seem to be the only viable option for the post Si area.
14nm节点以上的高性能计算设备——除了Si,还有其他的吗?
在8nm节点上,硅基技术的缩放路径似乎是可能的。功率限制将迫使以牺牲器件性能和对工艺变化的敏感性为代价来降低电源电压。下限Vdd=0.5V似乎是可行的。系统级的并行性将提供强调体系结构和软件开发的系统通道。特别是遗留代码在过渡时期将成为一个问题,因为这可能需要双电源多核架构。在这种情况下,器件技术必须同时满足高压和低压操作。除了8nm节点之外,还需要新的器件概念。考虑到2019年制造该节点的时间框架,现在必须展示设备。在这一点上,碳纳米管似乎是后Si区域唯一可行的选择。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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