Reflective infrared quarter-wave plate using silicon nanostructures

2014 International Conference on Optical MEMS and Nanophotonics Pub Date : 2014-10-16 DOI:10.1109/OMN.2014.6924589

W. Nakagawa, E. Keeler, S. Rydberg, Carol L. Baumbauer, Jesse Lee, Kyle Gray, D. Dickensheets

引用次数: 1

Abstract

The design, fabrication, and characterization of a reflective quarter-wave plate operating at 1550 nm wavelength are presented. This device consists of a subwavelength-period grating in silicon with an evaporated gold coating, and is compatible with standard fabrication processes.

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采用硅纳米结构的反射红外四分之一波片

介绍了工作在1550nm波长的反射四分之一波片的设计、制造和特性。该器件由镀有蒸发金涂层的亚波长周期硅光栅组成，并与标准制造工艺兼容。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

2014 International Conference on Optical MEMS and Nanophotonics

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