Study of Ferrocene/Silicon hybrid memories: Influence of the chemical linkers and device thermal stability

T. Pro, J. Buckley, R. Barattin, A. Calborean, M. Gely, K. Huang, G. Delapierre, F. Duclairoir, E. Jalaguier, P. Maldivi, B. De Salvo, S. Deleonibus, G. Ghibaudo
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引用次数: 3

Abstract

In this paper we propose an experimental and theoretical analysis of hybrid Ferrocene/Si memory structures. Two main aspects are studied: the influence of the chemical linker length on Ferrocene/Silicon electron transfer rate, and the thermal stability of the hybrid devices. X-Ray Photoelectron Spectroscopy was used to analyse the chemical structure of the molecular layers. Cyclic Voltammetry and impedance spectroscopy were employed to study the charge transfer dependence on the molecular linker. Impedance tests allowed us to evaluate the thermal stability of the molecular memories. The devices were submitted to different annealing temperatures and annealing times. The degradation of the molecular layer and the parasitic oxidation of the device active areas allowed us to explain results. Finally the main molecular parameters were computed through Density Functional Theory (DFT) calculations.
二茂铁/硅杂化存储器的研究:化学连接剂和器件热稳定性的影响
本文提出了二茂铁/硅杂化记忆结构的实验和理论分析。主要研究了化学连接剂长度对二茂铁/硅电子传递速率的影响以及杂化器件的热稳定性。利用x射线光电子能谱分析了分子层的化学结构。利用循环伏安法和阻抗谱法研究了分子连接剂对电荷转移的依赖性。阻抗测试使我们能够评估分子存储器的热稳定性。对器件进行了不同的退火温度和退火时间。分子层的降解和器件活性区的寄生氧化使我们能够解释结果。最后通过密度泛函理论(DFT)计算了主要分子参数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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