Incorporation of the Virtual Gate Effect and Consequences of its Neglect in the Simulation of ON-State $\pmb{I}_{\pmb{D}}-\pmb{V}_{\pmb{DS}}$ Curves of AlGaN/GaN HEMTs

Pradeep Dasari, C. Sharma, S. Karmalkar
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Abstract

We propose a simple method for incorporating the virtual gate effect present in Aluminum Gallium Nitride (AlGaN) / Gallium Nitride (GaN) High Electron Mobility Transistors (HEMTs) in numerical simulation of their ON-state current-voltage characteristics. Further, we show that the simulations which match the measured ON-state data neglecting the virtual gate effect end up employing an electron saturation velocity versus gate bias behavior that is qualitatively unphysical.
AlGaN/GaN HEMTs ON-State $\pmb{I}_{\pmb{D}}-\pmb{V}_{\pmb{DS}}$曲线仿真中的虚门效应及其忽略后果
我们提出了一种简单的方法,将存在于氮化镓铝(AlGaN) /氮化镓(GaN)高电子迁移率晶体管(hemt)中的虚门效应纳入其导通状态电流-电压特性的数值模拟中。此外,我们表明,与测量的on状态数据相匹配的模拟忽略了虚拟门效应,最终采用电子饱和速度与栅极偏置行为,这在定性上是非物理的。
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