Ni Diffusion Behavior and Bondability of Electroless NiP/PdP/Au Film

Akifumi Kurachi, Katsuyuki Tsuchida, T. Kawai
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Abstract

The Ni diffusion behavior of electroless NiP/PdP/Au film was investigated using Auger electron spectroscopy in this study. The diffusion coefficient of Ni in PdP was estimated from concentration profile by Einstein-Smoluchowski equation and Boltzman-Matano method. The obtained value was 3.5 ~4.7⨯10–20 m2s-1at 553 K. Furthermore, the bondability of the NiP/PdP/Au film before and after heat treatment was also studies to clarify the bonding reliability of the film of various thickness. Thicker NiP/PdP/Au film condition achieved high bonding reliability at least under the condition of this study.
化学法制备NiP/PdP/Au膜的Ni扩散行为及键合性
利用俄歇电子能谱研究了化学法制备的NiP/PdP/Au薄膜的Ni扩散行为。利用Einstein-Smoluchowski方程和Boltzman-Matano方法,从浓度分布曲线估计了Ni在PdP中的扩散系数。所得值为3.5 ~4.7,在553 K时为10 ~ 20 m2s-1。此外,还研究了热处理前后NiP/PdP/Au薄膜的粘接性能,以明确不同厚度薄膜的粘接可靠性。较厚的NiP/PdP/Au膜条件至少在本研究条件下获得了较高的键合可靠性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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