Excimer laser photochemistry of Al-alkyls monitored by dye laser mass spectroscopy

Abstract

Metal Organic Chemical Vapor Deposition (MOCVD) is a powerful technique for the generation of well-defined layers of metals and semiconductors [1]. Extending MOCVD by the use of lasers to Laser-MOCVD, selective area growth can be obtained ([2] and references therein). Laser induced deposition of structured aluminum films can be achieved using UV lasers and Al-alkyls like triisobutylaluminum (TIBA) as gaseous organometallic precursor [3, 4].