Key issues in substrate and liquid phase epitaxy of Hg1-xCdxTe from Hg-rich and Te-rich solutions

S. Gupta
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引用次数: 1

Abstract

In this paper we review the key issues in CdTe substrate which influence the quality of mercury cadmium telluride epilayer grown by liquid phase epitaxy. The issues are crystallinity, defects such as tellurium precipitates and impurities. We discuss the conditions to grow good quality epilayers of Hg1-xCdxTe from Hg-rich and Te-rich solutions at 470 degrees C. The physical parameters such as surface morphology, composition, thickness, x-ray full width at half maximum and broadening parameter from electrolyte electroreflectance obtained in two cases are compared. It is shown that epilayers grown form Hg-rich solution have, better surface morphology, lower growth rate and crystallinity and broadening parameter similar to layers grown form Te-rich solution. Compositionally epilayers grown form Te-rich solution are more uniform. The quality of an epilayer grown form Te-rich solution deteriorates faster than grown from Hg-rich solution when the cooling rate is increased in excess of 2 degrees C/h.
富氢和富te溶液中Hg1-xCdxTe衬底和液相外延的关键问题
本文综述了CdTe衬底中影响液相外延生长碲化汞镉薄膜质量的关键问题。问题是结晶度,缺陷,如碲沉淀和杂质。讨论了在470℃条件下富氢和富te溶液中生长高质量Hg1-xCdxTe脱膜的条件,比较了两种情况下获得的表面形貌、组成、厚度、x射线半最大值全宽和电解液电反射率展宽参数等物理参数。结果表明,与富te溶液中生长的薄膜相比,富g溶液中生长的薄膜具有更好的表面形貌、更低的生长速率、结晶度和展宽参数。在富te溶液中生长的成分涂层更加均匀。当冷却速率增加超过2℃/h时,富te溶液中生长的脱毛层质量比富hg溶液中生长的脱毛层恶化得更快。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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