Effect of film thickness on the memristive behavior of spin coated titanium dioxide thin films

N. Kamarozaman, M. A. R. Md Rashid, M. Musa, S. H. Herman, R. A. Bakar, W. Abdullah, M. Rusop
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引用次数: 10

Abstract

The paper presents the memristive behavior of spin-coated titania thin films. The spin speed during the deposition was varied and their effect on the film thickness and thus, to the memristive behavior was studied. Sample deposited at 5000 rpm produced thinner film thickness which result in better switching behavior. The sample showed larger OFF to ON resistance ratio of 5. All samples were measured 3 times for each positive and negative bias. It was found that the memristive behavior was repeatable for 2nd and 3rd measurement. The crystallinity of the films was characterized using Raman spectroscopy. In our work, it was observed that the film thickness mainly affects the switching behavior of memristive device instead of the crystallinity of the films.
薄膜厚度对自旋涂覆二氧化钛薄膜忆阻性能的影响
本文研究了自旋涂覆二氧化钛薄膜的记忆行为。研究了沉积过程中不同的自旋速度对薄膜厚度的影响,进而研究了自旋速度对薄膜忆阻行为的影响。在5000rpm下沉积的样品产生更薄的薄膜厚度,从而产生更好的开关行为。样品显示出较大的OFF / ON电阻比为5。所有样本分别测量3次正负偏倚。在第二次和第三次测量中发现记忆行为是可重复的。利用拉曼光谱对薄膜的结晶度进行了表征。在我们的工作中,我们观察到薄膜厚度主要影响记忆器件的开关行为,而不是薄膜的结晶度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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