Recent development on the modeling of electrical contact

Peng Zhang, Y. Lau
{"title":"Recent development on the modeling of electrical contact","authors":"Peng Zhang, Y. Lau","doi":"10.1109/IVEC.2013.6571177","DOIUrl":null,"url":null,"abstract":"Contact problems account for 40 percent of all electrical/electronic failures, ranging from small scale consumer electronic devices to large scale military and aerospace systems. This paper summarizes recent development on the theory of bulk contact and thin-film contacts, whose contact members may possess vastly different electrical resistivities. Current crowding at the rim of an electrode, scaling laws for contact resistance in a general geometry, and the novel relation between AC bulk contact resistance and DC thin film contact resistance are addressed.","PeriodicalId":283300,"journal":{"name":"2013 IEEE 14th International Vacuum Electronics Conference (IVEC)","volume":"43 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE 14th International Vacuum Electronics Conference (IVEC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IVEC.2013.6571177","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Contact problems account for 40 percent of all electrical/electronic failures, ranging from small scale consumer electronic devices to large scale military and aerospace systems. This paper summarizes recent development on the theory of bulk contact and thin-film contacts, whose contact members may possess vastly different electrical resistivities. Current crowding at the rim of an electrode, scaling laws for contact resistance in a general geometry, and the novel relation between AC bulk contact resistance and DC thin film contact resistance are addressed.
电接触建模的最新进展
接触问题占所有电气/电子故障的40%,范围从小型消费电子设备到大型军事和航空航天系统。本文综述了体触点和薄膜触点理论的最新进展。讨论了电极边缘的电流拥挤、接触电阻在一般几何结构中的标度规律以及交流体接触电阻与直流薄膜接触电阻之间的新关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信