157-nm Photosensitivity in Germanosilicate Waveguides

P. Herman, K. Beckley, S. Ness
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引用次数: 1

Abstract

In standard optical communication fiber, low Ge-dopant levels (~3%-GeO2) preclude strong photosensitivity responses, restricting index-of-refraction changes to 1-4 × 10-4 [1,2]. Type II index changes that rely on high laser fluence are less attractive because of material damage [3,4]. Therefore, sensitization techniques such as hydrogen loading [5], high germanium concentration [6], and flame brushing [7] are frequently employed to provide commercially attractive index-of-refraction changes of >10-3. However, this improved sensitivity trades against poor coupling efficiency and inconvenience when exposed fibers are connected into ordinary telecommunication networks.
锗硅酸盐波导的157nm光敏性
在标准光通信光纤中,低锗掺杂水平(~3%-GeO2)阻碍了强烈的光敏响应,将折射率变化限制在1-4 × 10-4[1,2]。由于材料损伤,依赖于高激光能量的II型指数变化不太具有吸引力[3,4]。因此,敏化技术如氢气加载[5]、高锗浓度[6]和火焰刷[7]经常被用来提供具有商业吸引力的>10-3的折射率变化。然而,当暴露的光纤连接到普通电信网络时,这种改进的灵敏度与耦合效率差和不便相交换。
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