Vertical heterojunction InAs/InGaAs nanowire MOSFETs on Si with Ion = 330 μA/μm at Ioff = 100 nA/μm and VD = 0.5 V

Olli-Pekka Kilpi, Jun Wu, J. Svensson, E. Lind, L. Wernersson
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引用次数: 9

Abstract

We present vertical InAs nanowire MOSFETs on Si with an In0.7Ga0.3As drain. The devices show Ion and gm/SS record performance for vertical MOSFETs and Ioff below 1 nA/μm at Vd 0.5 V. We show a device with gm=1.4 mS/μm and SS=85 mV/dec, therefore having Q-value (gm/SS) of 16. The device has Ion=330 μA/μm and 46 μA/μm at Ioff 100 nA/μm and 1 nA/μm, respectively. Furthermore, we show a device with SS=68 mV/dec and Ion=88 μA/μm at Ioff 1 nA/μm and Vd 0.5 V.
垂直异质结InAs/InGaAs纳米线mosfet在Si上,离子= 330 μA/μm, Ioff = 100 nA/μm, VD = 0.5 V
我们在Si上设计了垂直InAs纳米线mosfet,漏极为In0.7Ga0.3As。该器件在vvd 0.5 V下具有低于1 nA/μm的垂直mosfet和Ioff的离子和gm/SS记录性能。我们展示了一个gm=1.4 mS/μm, SS=85 mV/dec的器件,因此q值(gm/SS)为16。该器件在100 nA/μm和1 nA/μm下的离子强度分别为330 μA/μm和46 μA/μm。在1 nA/μm和0.5 V的电压下,SS=68 mV/dec,离子=88 μA/μm。
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