J. Spicher, B. Klepser, M. Beck, A. Rudra, R. Sachot, M. Ilegems
{"title":"A 20-Gbit/s monolithic photoreceiver using InAlAs/InGaAs HEMT's and regrown p-i-n photodiode","authors":"J. Spicher, B. Klepser, M. Beck, A. Rudra, R. Sachot, M. Ilegems","doi":"10.1109/ICIPRM.1996.492276","DOIUrl":null,"url":null,"abstract":"A two-step growth approach was used to monolithically integrate p-i-n InGaAs photodiodes with a InAlAs/InGaAs lattice matched to InP HEMT preamplifier. The HEMT structure was first grown by MBE and CBE was used to regrow the p-i-n structure. The use of a CVD-SiO/sub 2/ mask layer to achieve selective regrowth was found to severely degrade the underlying HEMT layers. Using a non selective regrowth method, high quality regrown material was obtained and a decrease of less than 10% was measured for the HEMT channel sheet resistance. With this integration process photoreceivers showing a bandwidth of 18 GHz were fabricated.","PeriodicalId":268278,"journal":{"name":"Proceedings of 8th International Conference on Indium Phosphide and Related Materials","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-04-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 8th International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1996.492276","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
A two-step growth approach was used to monolithically integrate p-i-n InGaAs photodiodes with a InAlAs/InGaAs lattice matched to InP HEMT preamplifier. The HEMT structure was first grown by MBE and CBE was used to regrow the p-i-n structure. The use of a CVD-SiO/sub 2/ mask layer to achieve selective regrowth was found to severely degrade the underlying HEMT layers. Using a non selective regrowth method, high quality regrown material was obtained and a decrease of less than 10% was measured for the HEMT channel sheet resistance. With this integration process photoreceivers showing a bandwidth of 18 GHz were fabricated.