Fully etched grating couplers for atomic layer deposited horizontal slot waveguides

M. Naiini, G. Malm, M. Ostling
{"title":"Fully etched grating couplers for atomic layer deposited horizontal slot waveguides","authors":"M. Naiini, G. Malm, M. Ostling","doi":"10.1109/ULIS.2011.5758007","DOIUrl":null,"url":null,"abstract":"Compact broadband grating couplers are designed and studied utilizing Atomic Layer Deposited Horizontal Slot waveguides, with four well-known material layers as the slot. Fabrication process conditions are experimentally studied to obtain more optimized designs. With the precision of the film thickness and refractive index provided by ALD, fabrication of reproducible grating couplers is feasible. An overview of design guidelines regarding the slot size and slot material is provided by 2D Finite Element Method calculations.","PeriodicalId":146779,"journal":{"name":"Ulis 2011 Ultimate Integration on Silicon","volume":"150 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-03-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ulis 2011 Ultimate Integration on Silicon","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ULIS.2011.5758007","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

Compact broadband grating couplers are designed and studied utilizing Atomic Layer Deposited Horizontal Slot waveguides, with four well-known material layers as the slot. Fabrication process conditions are experimentally studied to obtain more optimized designs. With the precision of the film thickness and refractive index provided by ALD, fabrication of reproducible grating couplers is feasible. An overview of design guidelines regarding the slot size and slot material is provided by 2D Finite Element Method calculations.
用于原子层沉积水平槽波导的全蚀刻光栅耦合器
利用原子层沉积水平槽波导,以四层已知材料层为槽,设计并研究了紧凑型宽带光栅耦合器。实验研究了制造工艺条件,得到了更优化的设计方案。利用ALD提供的薄膜厚度和折射率精度,可以制作可重复的光栅耦合器。关于槽尺寸和槽材料的设计准则的概述由二维有限元法计算提供。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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