Particle removal performance of 20nm rated filters for advanced wet chemical cleaning

Abstract

The newest 20 nm rated PTFE Alter revealed better performance in both theoretical simulation of particle reduction rate in the bath and actual number of particles on wafers at a fab as compared to the conventional 30 nm ratied filter. As a result, optimally designed 20 nm rated filter is strongly recommended to use as recirculation filters in wet-benches for advanced semiconductor manufacturing process.