Controlling strain in Ge on Si for EA modulators

R. Kuroyanagi, Y. Ishikawa, T. Tsuchizawa, S. Itabashi, K. Wada
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引用次数: 7

Abstract

The concept of how to control operation wavelength of Ge electroabsorption modulators with external stress is shown. Enough stress to shift absorption edge of Ge is applied to Ge on Si in our experiments.
EA调制器中锗硅应变控制
提出了利用外加应力控制锗电吸收调制器工作波长的概念。在实验中,我们对锗硅施加足够的应力,使锗的吸收边发生位移。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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