High gain bipolar photo-transistor operation in graphene/SiC Schottky interfaces: The role of minority carriers

Gabriel Brown, S. U. Omar, S. Shetu, A. Uddin, T. Rana, H. Song, T. Sudarshan, G. Koley, M. Chandrashekhar
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引用次数: 2

Abstract

We propose a new class of semiconductor transistor devices based on graphene/SiC and graphene/Si Schottky junctions that have the potential to be transformative. By using the graphene as collector/emitter in a bipolar transistor (BJT) and not as a channel material, there is relaxation of the tolerances in graphene thickness and quality, simplifying growth, device design and fabrication. This also enables the exploitation of engineered defects in thicker (2-5ML) graphene films for flexible electronics, currently not being considered, as well controlled uniform defects are preferred to localized random defect clusters. We will discuss an SiF4 based growth method that enables temperature programmed defect engineering. We will discuss the use of electron-beam induced current (EBIC) to characterize these materials. Based on recent results at our lab, a graphene/SiC Schottky junction behaves as a collector (GC) and an emitter (GE) in a BJT with common emitter gain, β>50, measured under phototransistor operation mode. The transparent graphene Schottky collector/emitter junction enables opto-electronic applications, minimizes series resistance in the device due to the thin graphene layer, and also minimizes charge storage time (diffusion capacitance), enabling high speed operation. Furthermore, the observation of β>50 with a GE-BJT demonstrates that significant minority carrier injection occurs in these Schottky junctions, contrary to what is commonly assumed. The injection of minority carriers has the ability to induce conductivity modulation in the underlying semiconductor, reducing overall device resistance. The role of minority carriers in Schottky Junctions will be discussed.
石墨烯/SiC肖特基界面的高增益双极光电晶体管操作:少数载流子的作用
我们提出了一种基于石墨烯/SiC和石墨烯/Si肖特基结的新型半导体晶体管器件,具有变革性的潜力。通过在双极晶体管(BJT)中使用石墨烯作为集电极/发射极,而不是作为沟道材料,石墨烯厚度和质量的公差得到了放松,简化了生长、器件设计和制造。这也使得在较厚(2-5ML)的柔性电子石墨烯薄膜上开发工程缺陷成为可能,目前还没有考虑到这一点,因为控制良好的均匀缺陷比局部随机缺陷簇更受欢迎。我们将讨论一种基于SiF4的生长方法,使温度程序化缺陷工程成为可能。我们将讨论使用电子束感应电流(EBIC)来表征这些材料。根据我们实验室最近的结果,石墨烯/SiC肖特基结在光电晶体管工作模式下测量的共发射极增益为β bbb50的BJT中表现为集电极(GC)和发射极(GE)。透明石墨烯肖特基集电极/发射极结实现了光电应用,由于石墨烯层薄,器件中的串联电阻最小化,并且还最小化了电荷存储时间(扩散电容),实现了高速运行。此外,用GE-BJT对β bbb50的观察表明,在这些肖特基结中发生了显著的少数载流子注入,这与通常的假设相反。少数载流子的注入能够在底层半导体中诱导电导率调制,从而降低整个器件电阻。我们将讨论少数载流子在肖特基结中的作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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