{"title":"Simulated annealing based yield enhancement of layouts","authors":"R. Karri, A. Orailoglu","doi":"10.1109/GLSV.1994.289975","DOIUrl":null,"url":null,"abstract":"This paper presents DEFT, a system for synthesizing defect-tolerant layouts, that in-grains tolerance to fabrication induced defects. This is accomplished by dispersing nets with large overlaps into nonadjacent tracks. DEFT also affords trade-offs between area (measured as the number of tracks) and yield of the resulting layout. The defect-tolerant layouts synthesized by DEFT have been consistently superior to those generated by other layout synthesis systems.<<ETX>>","PeriodicalId":330584,"journal":{"name":"Proceedings of 4th Great Lakes Symposium on VLSI","volume":"133 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-03-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 4th Great Lakes Symposium on VLSI","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GLSV.1994.289975","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
This paper presents DEFT, a system for synthesizing defect-tolerant layouts, that in-grains tolerance to fabrication induced defects. This is accomplished by dispersing nets with large overlaps into nonadjacent tracks. DEFT also affords trade-offs between area (measured as the number of tracks) and yield of the resulting layout. The defect-tolerant layouts synthesized by DEFT have been consistently superior to those generated by other layout synthesis systems.<>