Monte Carlo simulation in VDDmin modeling across Fab process

Huiping Guo, Yang Yang, Jiang Bowen
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引用次数: 0

Abstract

VDDmin is defined as the lowest supply voltage at which a device can produce correct logic states. It is typically obtained by performing a binary or linear supply voltage search. VDDmin or very-low voltage (VLV) testing is a non-IDDQ defect based test method that has been shown to be an effective method to screen manufacturing defects [1, 2, 3, 4]. It is taken as an indicator of device performance and reliability. Monte Carlo simulation is a random sampling based computational methodology, used extensively for engineering analysis [5, 6, 7]. This paper discuss a VDDmin determination methodology base on-Monte Carlo simulation, case study is presented to illustrate that this approach can precisely predict yield impact due to process shift.
VDDmin跨Fab过程建模中的蒙特卡罗仿真
VDDmin被定义为器件能够产生正确逻辑状态的最低电源电压。它通常是通过执行二进制或线性电源电压搜索获得的。VDDmin或极低电压(VLV)测试是一种非iddq缺陷的测试方法,已被证明是筛选制造缺陷的有效方法[1,2,3,4]。它是设备性能和可靠性的一个指标。蒙特卡罗模拟是一种基于随机抽样的计算方法,广泛用于工程分析[5,6,7]。本文讨论了一种基于蒙特卡罗模拟的VDDmin确定方法,并通过实例说明该方法可以准确预测工艺移位对产量的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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