Air-annealing effects on SiO2/ITO coating

Yi-qin Ji, Deying Chen, Weihao Li, Bingjun Wu, J. Zong, Dan-dan Liu, Yanmin Zhang
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引用次数: 0

Abstract

Indium tin oxide (ITO) thin film with SiO2 protective upper layer prepared by electron beam evaporation was annealed in air up to 300°C. Evolution of transmittance, resistance and surface morphology of this SiO2/ITO coating was studied. Transmittance in visible and near-infrared range both increased while absorption edge exhibited red shift after annealing. Resistance increased monotonously with rising annealing temperature, yet increments became smaller at temperatures above 270°C. Micron-defects were observed on the surface of SiO2/ITO coating after annealing. Enhancement of crystallinity of ITO layer at high temperatures was thought to be responsible for these morphology and resistance evolutions.
空气退火对SiO2/ITO涂层的影响
采用电子束蒸发法制备了具有SiO2保护层的氧化铟锡(ITO)薄膜,并将其在300℃的空气中退火。研究了该SiO2/ITO涂层的透光率、电阻和表面形貌的演变。退火后,可见光和近红外透光率均增加,吸收边出现红移。电阻随退火温度的升高而单调增加,但当温度高于270℃时,电阻增量变小。退火后的SiO2/ITO涂层表面出现微米级缺陷。ITO层在高温下结晶度的增强被认为是这些形貌和电阻演变的原因。
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