Body bias effect of GaN schottky barrier MOSFET with ITO source/drain

Chang-Ju Lee, Tae-Hyeon Kim, Dong‐Seok Kim, S. Sung, B. Jung, Y. Heo, Jung-Hee Lee, S. Hahm
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Abstract

We fabricated GaN SB-MOSFET using the ITO source/drain and gate with very high drain current and low threshold voltage. Furthermore, we tried to check the body bias effect of the GaN SB-MOSFET after forming the ohmic contact to the substrate. We could control threshold voltage by body bias that makes the device more useful. It is applicable to many of electric circuit applications such as logic gate, memory cell transistors, and image sensors, which are potential area for digital GaN UV optoelectronics.
ITO源极/漏极GaN肖特基势垒MOSFET的体偏效应
我们使用ITO源极漏极和栅极制造GaN SB-MOSFET,具有非常高的漏极电流和低阈值电压。此外,我们试图在与衬底形成欧姆接触后检查GaN SB-MOSFET的体偏置效应。我们可以通过身体偏置来控制阈值电压,使设备更有用。它适用于逻辑门、存储单元晶体管和图像传感器等许多电路应用,是数字GaN紫外光电子学的潜在领域。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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