{"title":"Investigation of quantum effects in monolithic integrated circuits based on RTDs and HEMTs by simulations with a quantum hydrodynamic transport model","authors":"J. Hontschel, W. Klix, R. Stenzel","doi":"10.1109/ISCS.2003.1239989","DOIUrl":null,"url":null,"abstract":"Circuits which using resonant tunneling diodes (RTDs) hold promise as a technology for ultra dense high speed integrated digital logic circuits. The negative differential resistance of the current-voltage characteristic in RTDs can be used to reduce device counts per circuit functions, thus increasing circuit integration density. The very fast switching capability makes them suitable for high speed circuits. High electron mobility transistors (HEMTs) integrated with RTDs can give similarly avails as well as also reducing power consumption, due to the gain and high input to output isolation provided by the transistors. This paper describes the first reported numerical simulations of monolithic integrated circuits of resonant tunneling structures and high electron mobility transistor based on 1%.53G%.47As/ Ino,szAlo,48As/InP with a novel quantum hydrodynamic transport model (QHD-Model). For the numerical investigations the device simulator SIMBA is used, which is capable to handle complex device geometries as well as various physical models represented by certain sets of partial differential equations. The quantum potential is implemented to include quantum mechanical transport phenomena in different quantum size devices. The coupled solution of the hydrodynamic transport model and the quantum correction potential, which is included in the transport and in the energy balance equations, allows to model resonant tunneling of carriers through potential barriers and particle build up in potential wells. The quantum hydrodynamic simulations, which is based on a quantum fluid dynamic model [I], offers expanding possibilities for the understanding as well as the design of novel quantum sized semiconductor devices. The device structure of the monolithic integrated parallel connection between RTD and HEMT based on I ~ ~ . ~ , G ~ , ~ ~ A S / I ~ ~ . ~ ~ A I O . ~ ~ A S / I ~ P , is represented in Fig. 1. Experimental investigations of such structures are shown in [2], where they are applied for high performance monostablebistable transition logic elements. The calculated operating principle of the integrated parallel connection of the RTD with a HEMT is represented in the output characteristics of Fig. 2. The total drain current (ID) is equal to the sum of the current passing through the RTD (IRTD) and the HEMT ( I ~ M T ) . Since the gate-source voltage (VGS) can modulate IHEMT, ID is also modulated by VGS. The result is that the peak current of the integrated device, especially of the integrated RTD, is modulated by VGS. It should be noted that the resonant-tunneling current through the RTD remains unchanged at different gate biases. Fig. 3 shows the transfer characteristics at different drain-source voltages of the integrated parallel connection of the RTD and the HEMT. How expected, an increasing of the transfer characteristic by lower drain-source voltages can be detected. The electron density at VDS,~* and V D S , ~ ~ ~ ~ ~ in the range of the RTD is illustrated in Fig. 4. The increasing of the electron density between the potential hamers at V D S , ~ ~ ~ is identified with the tunnel process through the RTD. Further details of the QHD-Model and the calculated RTD-HEMT device as well as more results of different structure variations, especially the gate width (W,) and the RTD area ( A R ~ ) , will be presented in the paper.","PeriodicalId":404065,"journal":{"name":"2003 International Symposium on Compound Semiconductors","volume":"517 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2003 International Symposium on Compound Semiconductors","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISCS.2003.1239989","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Circuits which using resonant tunneling diodes (RTDs) hold promise as a technology for ultra dense high speed integrated digital logic circuits. The negative differential resistance of the current-voltage characteristic in RTDs can be used to reduce device counts per circuit functions, thus increasing circuit integration density. The very fast switching capability makes them suitable for high speed circuits. High electron mobility transistors (HEMTs) integrated with RTDs can give similarly avails as well as also reducing power consumption, due to the gain and high input to output isolation provided by the transistors. This paper describes the first reported numerical simulations of monolithic integrated circuits of resonant tunneling structures and high electron mobility transistor based on 1%.53G%.47As/ Ino,szAlo,48As/InP with a novel quantum hydrodynamic transport model (QHD-Model). For the numerical investigations the device simulator SIMBA is used, which is capable to handle complex device geometries as well as various physical models represented by certain sets of partial differential equations. The quantum potential is implemented to include quantum mechanical transport phenomena in different quantum size devices. The coupled solution of the hydrodynamic transport model and the quantum correction potential, which is included in the transport and in the energy balance equations, allows to model resonant tunneling of carriers through potential barriers and particle build up in potential wells. The quantum hydrodynamic simulations, which is based on a quantum fluid dynamic model [I], offers expanding possibilities for the understanding as well as the design of novel quantum sized semiconductor devices. The device structure of the monolithic integrated parallel connection between RTD and HEMT based on I ~ ~ . ~ , G ~ , ~ ~ A S / I ~ ~ . ~ ~ A I O . ~ ~ A S / I ~ P , is represented in Fig. 1. Experimental investigations of such structures are shown in [2], where they are applied for high performance monostablebistable transition logic elements. The calculated operating principle of the integrated parallel connection of the RTD with a HEMT is represented in the output characteristics of Fig. 2. The total drain current (ID) is equal to the sum of the current passing through the RTD (IRTD) and the HEMT ( I ~ M T ) . Since the gate-source voltage (VGS) can modulate IHEMT, ID is also modulated by VGS. The result is that the peak current of the integrated device, especially of the integrated RTD, is modulated by VGS. It should be noted that the resonant-tunneling current through the RTD remains unchanged at different gate biases. Fig. 3 shows the transfer characteristics at different drain-source voltages of the integrated parallel connection of the RTD and the HEMT. How expected, an increasing of the transfer characteristic by lower drain-source voltages can be detected. The electron density at VDS,~* and V D S , ~ ~ ~ ~ ~ in the range of the RTD is illustrated in Fig. 4. The increasing of the electron density between the potential hamers at V D S , ~ ~ ~ is identified with the tunnel process through the RTD. Further details of the QHD-Model and the calculated RTD-HEMT device as well as more results of different structure variations, especially the gate width (W,) and the RTD area ( A R ~ ) , will be presented in the paper.
使用谐振隧道二极管(rtd)的电路有望成为超密集高速集成数字逻辑电路的一种技术。rtd中电流-电压特性的负差分电阻可用于减少每个电路功能的器件计数,从而增加电路集成密度。非常快的开关能力使它们适用于高速电路。与rtd集成的高电子迁移率晶体管(hemt)由于晶体管提供的增益和高输入输出隔离,可以提供类似的利用以及降低功耗。本文介绍了首次报道的基于1%、53%和53%的谐振隧道结构单片集成电路和高电子迁移率晶体管的数值模拟。47As/ Ino,szAlo,48As/InP与一个新的量子流体动力学输运模型(QHD-Model)。对于数值研究,使用器件模拟器SIMBA,它能够处理复杂的器件几何形状以及由某些偏微分方程集表示的各种物理模型。量子势的实现包括不同量子尺寸器件中的量子力学输运现象。流体动力学输运模型和量子修正势的耦合解包含在输运方程和能量平衡方程中,可以模拟载流子通过势垒的共振隧穿和势阱中粒子的积聚。基于量子流体动力学模型的量子流体动力学模拟[I]为理解和设计新型量子大小的半导体器件提供了扩展的可能性。介绍了基于I ~ ~的RTD与HEMT单片集成并联的器件结构。~, g ~, ~ ~ a s / I ~ ~。~ ~ a I o。~ ~ A S / I ~ P,如图1所示。这种结构的实验研究显示在[2]中,其中它们被应用于高性能单稳态双稳态过渡逻辑元件。计算得到的RTD与HEMT集成并联的工作原理如图2输出特性所示。总漏极电流(ID)等于通过RTD (IRTD)和HEMT (I ~ MT)的电流之和。由于门源电压(VGS)可以调制IHEMT,因此ID也可以由VGS调制。结果表明,集成器件的峰值电流,特别是集成RTD的峰值电流,是由VGS调制的。应该注意的是,通过RTD的谐振隧穿电流在不同的栅极偏置下保持不变。图3显示了RTD和HEMT集成并联在不同漏源电压下的传输特性。正如预期的那样,通过降低漏源电压可以检测到传输特性的增加。RTD范围内VDS,~*和VDS,~ ~ ~ ~ ~处的电子密度如图4所示。在vds, ~ ~ ~处,势锤之间的电子密度的增加与通过RTD的隧道过程有关。本文将进一步详细介绍qhd模型和计算的RTD- hemt器件,以及不同结构变化的更多结果,特别是栅极宽度(W,)和RTD面积(A R ~)。