Robust Real-Time Thin Film Thickness Estimation

C. Kiew, A. Tay, W.K. Ho, K. W. Lim, J.H. Lee
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引用次数: 1

Abstract

The dissolution of photoresist in developer solution often leads to changes in the chemical composite of the solution which hinder film thickness estimation. This paper addresses this issue by proposing a modified fringe order computation (MFOC) method which analyses reflected light intensity data acquired using commercially available optical spectrometry system. MFOC uses simple arithmetic operations and is capable of computing film thickness at real-time. It is more reliable as compared to other methods during develop step in microlithography process
鲁棒实时薄膜厚度估计
光刻胶在显影液中的溶解往往会导致溶液化学成分的变化,从而影响薄膜厚度的估计。本文提出了一种改进的条纹阶计算(MFOC)方法,该方法分析了利用市售光学光谱系统获得的反射光强度数据。MFOC使用简单的算术运算,能够实时计算薄膜厚度。在微光刻工艺的显影阶段,与其他方法相比,它更可靠
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