Excellent 22FDX Hot-Carrier Reliability for PA Applications

T. Chen, Chi Zhang, W. Arfaoui, A. Bellaouar, S. Embabi, G. Bossu, M. Siddabathula, Kok Wai Johnny Chew, S. N. Ong, M. Mantravadi, K. Barnett, J. Bordelon, R. Taylor, S. Janardhanan
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引用次数: 25

Abstract

This work shows the excellent HCI (hot-carrier injection) reliability that 22FDX demonstrates for mmWave PA applications. The underlying device physics to explain this performance are also shown. Due to the fact that fully depleted SOI (FDSOI) eliminates the lateral bipolar device, the MOSFETs in 22FDX® technology have an increased BVDSs when compared to a device in a partially depleted SOI (PDSOI) technology. A 2-stack PA is presented that demonstrates excellent reliability against all HCI stress. The device aging model is built based on the device stress data specific for PA applications. RelXpert is used to simulate device aging based on the model and suggests excellent PA reliability even under the worst mismatch condition.
卓越的22FDX热载波可靠性,适用于PA应用
这项工作显示了22FDX在毫米波PA应用中出色的HCI(热载流子注入)可靠性。还显示了解释这种性能的底层设备物理。由于完全耗尽SOI (FDSOI)消除了侧双极器件,与部分耗尽SOI (PDSOI)技术的器件相比,22FDX®技术中的mosfet具有更高的bvds。提出了一种两层PA,在所有HCI应力下都具有出色的可靠性。设备老化模型是基于PA应用特有的设备应力数据建立的。使用RelXpert基于模型模拟设备老化,即使在最坏的不匹配条件下,也显示出出色的PA可靠性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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