{"title":"Grain filtering in MILC and its impact on performance of n- and p-channel TFTs","authors":"S. Nagata, G. Nakagawa, T. Asano","doi":"10.1109/TENCON.2010.5686540","DOIUrl":null,"url":null,"abstract":"Metal induced lateral crystallization (MILC) using nickel di-silicide catalyst is able to grow poly-Si films having a preferential crystal orientation along surface normal direction. The poly-Si film prepared by MILC, however, contains randomly distributed sub-grain boundaries which may degrade the performance of poly-Si TFT fabricated using the MILC film. We have investigated effects of patterning of the a-Si film prior to MILC on the growth characteristics and TFT performance. When the width of a-Si film pattern was narrowed, grain filtering effect occurred and, as a result, poly-Si islands whose active region for TFT is mostly composed of single oriented crystal were successfully grown. We characterized the film thus prepared by fabricating n and p-channel TFTs. TFTs were fabricated using the standard high temperature process. The results indicated that TFT performance is very much improved in terms of carrier mobility, on-current, and sub-threshold swing. We conclude that the pre-growth pattering of a-Si in MILC is useful technique to improve the performance of MILC TFTs.","PeriodicalId":101683,"journal":{"name":"TENCON 2010 - 2010 IEEE Region 10 Conference","volume":"136 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"TENCON 2010 - 2010 IEEE Region 10 Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/TENCON.2010.5686540","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Metal induced lateral crystallization (MILC) using nickel di-silicide catalyst is able to grow poly-Si films having a preferential crystal orientation along surface normal direction. The poly-Si film prepared by MILC, however, contains randomly distributed sub-grain boundaries which may degrade the performance of poly-Si TFT fabricated using the MILC film. We have investigated effects of patterning of the a-Si film prior to MILC on the growth characteristics and TFT performance. When the width of a-Si film pattern was narrowed, grain filtering effect occurred and, as a result, poly-Si islands whose active region for TFT is mostly composed of single oriented crystal were successfully grown. We characterized the film thus prepared by fabricating n and p-channel TFTs. TFTs were fabricated using the standard high temperature process. The results indicated that TFT performance is very much improved in terms of carrier mobility, on-current, and sub-threshold swing. We conclude that the pre-growth pattering of a-Si in MILC is useful technique to improve the performance of MILC TFTs.