Third harmonic generation of soluble vanadyl-phthalocyanine doped in polymer film

H. Nakano, A. Maeda, H. Furuhashi, T. Yoshikawa, Y. Uchida, K. Kojima, A. Ohashi, S. Ochiai, M. Ieda, T. Mizutani
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引用次数: 1

Abstract

The third-order optical susceptibilities of PMMA thin films doped with soluble vanadyl-phthalocyanine derivatives ((t-Bu)/sub n/VOPc) were studied by Maker fringe method. We intended to control the molecular packing of VOPc in PMMA in order to improve third-order optical susceptibility (/spl chi//sup (3)/). For this purpose we selected soluble /sub n/VOPc derivatives and obtained a packing structure similar to the phase II of VOPc thin film. Packing control of the phthalocyanine molecules was carried out by exposing PMMA films to organic solvent vapour. PMMA thin films doped with (t-Bu)/sub 4/VOPc, (t-Bu)/sub 1.45/VOPc and (t-Bu)/sub 1.44/VOPc were treated with dichloroethane vapour in a desiccator at room temperature. The intensity of THG are in the order of (t-Bu)/sub 1.45/VOfc/PMMA>(t-Bu)/sub 1.44/VOPc/PMMA>VOPc(t-Bu)/sub 4/VOPc/PMMA. This means that the hyperpolarisability of (t-Bu)/sub n/VOPc molecule depends upon a number of tert-butyl radicals. The third-order optical susceptibility (/spl chi//sup (3)/) was estimated for (t-Bu)/sub 1.45/VOPc/PMMA. Its value was about 7/spl times/10/sup -12/ esu. This technique is useful to make optical waveguide.
可溶酞菁钒掺杂聚合物薄膜的三次谐波生成
采用Maker条纹法研究了可溶酞菁钒衍生物(t-Bu /sub - n/VOPc)掺杂PMMA薄膜的三阶光学敏感性。我们打算控制VOPc在PMMA中的分子堆积,以提高三阶光敏率(/spl chi//sup(3)/)。为此,我们选择了可溶性/亚氮/VOPc衍生物,并获得了类似于VOPc薄膜II相的填充结构。通过将PMMA薄膜暴露在有机溶剂蒸气中,对酞菁分子进行了填料控制。用二氯乙烷蒸汽在干燥器中室温处理掺杂(t-Bu)/sub 4/VOPc、(t-Bu)/sub 1.45/VOPc和(t-Bu)/sub 1.44/VOPc的PMMA薄膜。THG强度依次为(t-Bu)/sub 1.45/VOfc/PMMA>(t-Bu)/sub 1.44/VOPc/PMMA>VOPc(t-Bu)/sub 4/VOPc/PMMA。这意味着(t-Bu)/sub - n/VOPc分子的超极化性取决于叔丁基自由基的数量。估算了(t-Bu)/sub 1.45/VOPc/PMMA的三阶光磁化率(/spl chi//sup(3)/)。其值约为7/spl × /10/sup -12/ esu。该技术可用于制作光波导。
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