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Abnormal Gate Oxide Failure due to Stress enhanced Polycrystalline Silicon Diffusion

30th European Solid-State Device Research Conference Pub Date : 2000-09-11 DOI:10.1109/ESSDERC.2000.194729
Yongseok Ahn, D. Ha, G. Koh, Taeyoung Chung, Kinam Kim
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应力增强多晶硅扩散引起的栅氧化异常失效
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30th European Solid-State Device Research Conference
30th European Solid-State Device Research Conference
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