The effect of hydrostatic pressure on the indium antimonide thin films

A. Druzhinin, A. Kutrakov, N. Liakh-Kaguy
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Abstract

Studies the effect of hydrostatic pressure on the indium antimonide thin films n- and p-type conductivity were carried out in the temperature range (−180 ÷ +100) °C. Temperature dependences of the resistance and hydrostatic pressure coefficient for sensitive elements based on InSb thin films doped with zinc and tellurium were studied. Obtained the high values of hydrostatic pressure coefficient and linear character its temperature dependence allows to suggest doped InSb thin films promising material for creating of the hydrostatic pressure sensors up to 5000 bar on their basis operating in the climatic temperature range.
静水压力对锑化铟薄膜的影响
研究了静水压力对锑化铟薄膜n型和p型电导率的影响,温度范围为(−180 ~ +100)℃。研究了锌碲掺杂InSb薄膜敏感元件的电阻和静水压力系数随温度的变化规律。获得了较高的静水压力系数和线性特性,其温度依赖性允许建议掺杂InSb薄膜在气候温度范围内工作的基础上,用于制造高达5000 bar的静水压力传感器的有前途的材料。
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