Low cost process for development of electrostatically actuated optical devices using gold electroplating

Amit Kumar, Prem Kumar, D. Bansal, K. Rangra
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Abstract

This paper presents a low cost fabrication process for development of electrostatically actuated optical microstructures. To illustrate the process - a design, fabrication and measurement iteration for digital micromirror test structures is presented. The structures are fabricated on Single Crystal Silicon wafer using surface micromachining and gold electroplating. The major focus of the work has been on the process compatibility with conventional CMOS fabrication technology, lower cost, complexity, lower surface roughness and susceptibility of compliant structures to thermal cycling during the process. The structures consist of 1-2 micron thick micromirrors suspended at a height of 2-5 micron and surface roughness of 22-30 nm. Vertical deflection (3 micron), pull-in voltage (31V) and mechanical resonance frequency (25 KHz) match within 5-10% to the simulated design. The approach can be extended to realize optical switches, light modulators, grating structures, barcode readers and optical scanners.
电镀金的低成本静电驱动光学器件的开发
本文提出了一种开发静电驱动光学微结构的低成本制造工艺。介绍了数字微镜测试结构的设计、制造和测量迭代过程。在单晶硅片上采用表面微加工和电镀金的方法制备了该结构。这项工作的主要重点是与传统CMOS制造技术的工艺兼容性、更低的成本、更低的复杂性、更低的表面粗糙度以及柔性结构在工艺过程中对热循环的敏感性。该结构由1-2微米厚的微镜组成,悬浮在2-5微米的高度,表面粗糙度为22-30 nm。垂直偏转(3微米)、拉入电压(31V)和机械共振频率(25 KHz)与模拟设计匹配在5-10%范围内。该方法可扩展到实现光开关、光调制器、光栅结构、条码读取器和光学扫描仪。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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