Effects of Voltage and Temperature Variations on the Electrical Masking Capability of Sub-65 nm Combinational Logic Circuits

Semiu A. Olowogemo, W. H. Robinson, D. Limbrick
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引用次数: 2

Abstract

Single Event Transients (SETs) induced from radiation strikes on an integrated circuit (IC) can be masked electrically by logic gates while propagating through the circuit towards a storage element (e.g., flip-flop). With the continuous scaling of CMOS technology, there are simultaneous reductions in voltage, cell size, and internal capacitances that impact the properties of the gates. The combined impact causes a reduction in the electrical masking capability of the gates. The reduction in electrical masking means that transients are more likely to reach the storage elements. In addition, variations in voltage and temperature could enhance the propagation of transient towards the storage elements. This paper describes the effects of temperature and voltage variations on the electrical masking of sub-65 nm combinational logic circuits. The worst-case temperature increases the SET pulsewidth by 57.6%. The worst-case voltage increases the SET pulsewidth by 51.2%. The pulses are therefore less likely to be masked electrically.
电压和温度变化对sub - 65nm组合逻辑电路电掩蔽能力的影响
由集成电路(IC)上的辐射照射引起的单事件瞬态(set)可以在通过电路传播到存储元件(例如触发器)时通过逻辑门进行电屏蔽。随着CMOS技术的不断缩小,影响栅极性能的电压、电池尺寸和内部电容也在不断减小。综合影响导致栅极的电屏蔽能力降低。电屏蔽的减少意味着瞬态更有可能到达存储元件。此外,电压和温度的变化可以增强瞬态向存储元件的传播。本文研究了温度和电压变化对亚65nm组合逻辑电路电掩蔽的影响。最坏温度使SET脉冲宽度增加57.6%。最差电压使SET脉冲宽度增加51.2%。因此,脉冲不太可能被电掩盖。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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