Current capacity evaluation of a cantilever probe

L. Thomas, H. Kow, Selvam Palasundram
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引用次数: 4

Abstract

The tungsten-rhenium (WRe) 3mil cantilever probe is widely used in wafer probe at ON Semiconductors. The maximum current that can be supplied to a DUT is restricted by the current capacity of the probe needles. A typical 3 mil tip probe can carry 2 - 3 Amps at a short burst current (I short) for a <;10 ms pulse time. Probing at a higher current level with minimal number of probes can cause current over crowding at probe tip which produces excessive heat due to electric charge and contact resistance. This heat can melt surface material and contaminant which can attach to the probe tip causing it to be deformed thus increasing resistance and temperature at the contact point. Accordingly more heat is generated by this causing the contaminant at probe tip to be further oxidized producing an insulating layer between DUT and probe. This results in spark occurrence during high current testing which may cause damage to the device. This paper describes the experiments carried out to guarantee the appropriate pulsed current level that can be carried through a single 3 mil tip probe without causing the probe tip to melt, get oxidized and generate sparks which could lead to devices damage due to EOS. Two MOSFET devices with current ratings of 2.0 Amps and 2.6 Amps respectively were used for this evaluation to determine the allowable operating pulsed current a probe can withstand. A Total of 85 K dies were probed, assembled and final tested. The test fallouts that were analyzed did not show any indication of an EOS signature on die cause by probe needles.
悬臂探头的电流容量评估
钨铼(WRe)悬臂探针在安森美半导体广泛应用于晶圆探针。可提供给被测设备的最大电流受测针的电流容量的限制。一个典型的3mil探针可以在短突发电流(I short)下携带2 - 3安培,脉冲时间< 10ms。用最小数量的探头在较高的电流水平下进行探测,会导致探头尖端的电流过度拥挤,由于电荷和接触电阻而产生过多的热量。这种热量可以熔化表面材料和污染物,这些材料和污染物可以附着在探头尖端,使其变形,从而增加接触点的电阻和温度。因此,由此产生更多的热量,导致探头尖端的污染物进一步氧化,在被测件和探头之间产生绝缘层。这将导致在大电流测试期间产生火花,从而可能对设备造成损坏。本文描述了为保证适当的脉冲电流水平而进行的实验,该脉冲电流水平可以通过单个3mil尖端探针,而不会导致探针尖端熔化、氧化和产生火花,从而导致EOS导致设备损坏。两个额定电流分别为2.0安培和2.6安培的MOSFET器件用于本次评估,以确定探头可以承受的允许工作脉冲电流。共探测、组装和最终测试了85个K模具。分析的测试沉降物没有显示任何由探针针引起的EOS签名的迹象。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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