A set of test structures for the development of a CMOS-MEMS technology

Abstract

In this work, a set of test structures that meets the emerging need for Micro-Electro-Mechanical Systems (MEMS) integration process monitoring and material/device property measurement at the wafer level is presented. The CMOS-MEMS test structures are designed to evaluate and assist the development of an integrated CMOS-MEMS process. The acquired data from the test structures will be useful for identifying the possible electrical and/or mechanical variations on the material properties and devices performance due to the fabrication process.