{"title":"Impact of within-die parameter fluctuations on future maximum clock frequency distributions","authors":"K. Bowman, J. Meindl","doi":"10.1109/CICC.2001.929761","DOIUrl":null,"url":null,"abstract":"The impact of parameter fluctuations on future circuit performance is evaluated by employing rigorously derived device and circuit models to calculate the critical path delay distributions resulting from die-to-die and within-die fluctuations. Utilizing these distributions with a recently derived FMAX distribution model validated by measured data, the effect of within-die fluctuations on the FMAX mean is forecast for the 180, 130, 100, 70 and 50 nm technology generations. Systematic within-die fluctuations impose the largest performance degradation resulting from parameter fluctuations. Assuming a 3/spl sigma/ channel length deviation of 20%, projections for the 50 nm technology generation indicate that essentially a generation of performance gain can be lost due to systematic within-die fluctuations. This analysis should encourage efforts toward tightening within-die process controls and developing circuit design methodologies that suppress the impact of within-die parameter fluctuations on circuit performance.","PeriodicalId":101717,"journal":{"name":"Proceedings of the IEEE 2001 Custom Integrated Circuits Conference (Cat. No.01CH37169)","volume":"370 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-05-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"46","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the IEEE 2001 Custom Integrated Circuits Conference (Cat. No.01CH37169)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CICC.2001.929761","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 46
Abstract
The impact of parameter fluctuations on future circuit performance is evaluated by employing rigorously derived device and circuit models to calculate the critical path delay distributions resulting from die-to-die and within-die fluctuations. Utilizing these distributions with a recently derived FMAX distribution model validated by measured data, the effect of within-die fluctuations on the FMAX mean is forecast for the 180, 130, 100, 70 and 50 nm technology generations. Systematic within-die fluctuations impose the largest performance degradation resulting from parameter fluctuations. Assuming a 3/spl sigma/ channel length deviation of 20%, projections for the 50 nm technology generation indicate that essentially a generation of performance gain can be lost due to systematic within-die fluctuations. This analysis should encourage efforts toward tightening within-die process controls and developing circuit design methodologies that suppress the impact of within-die parameter fluctuations on circuit performance.