S. Ohbayashi, M. Yabuuchi, K. Nii, Y. Tsukamoto, S. Imaoka, Y. Oda, M. Igarashi, M. Takeuchi, H. Kawashima, H. Makino, Y. Yamaguchi, K. Tsukamoto, M. Inuishi, K. Ishibashi, H. Shinohara
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引用次数: 52
Abstract
We propose a new design scheme to improve the SRAM read and write operation margins in the presence of a large Vth variability. By applying this scheme to a 0.494 mum2 SRAM cell with a beta ratio of 1, which is an aggressively small cell size, we can achieve a high-yield 8M-SRAM for a wide range of Vth value using a 65 nm LSTP CMOS technology