Accurate modeling of energy-dependent impact ionization rate for hydrodynamic simulators of semiconductor devices

M.H. El-Sahn
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引用次数: 0

Abstract

Proposes an accurate nonlocal model describing the impact ionization rate in semiconductor devices in terms of the carrier mean energy. The model is developed from the general set of hydrodynamic equations (HDEs) without presuming any form a priori for the carrier distribution function. A fundamental feature of the present model is that it takes into account the band structure effect on the carrier generation rate through the carrier-energy relaxation time. In order to confirm the validity of the model, it is compared with the famous empirical and analytical models. In contrary to the previous energy-dependent models, the present one does not underestimate the generation rate by impact ionization at high fields. So, it can be used for better predictions of the avalanche breakdown voltage and avalanche injection currents in semiconductor devices.
半导体器件流体动力模拟器能量依赖冲击电离率的精确建模
提出了用载流子平均能量描述半导体器件中冲击电离率的精确非定域模型。该模型是在一般水动力方程(HDEs)的基础上建立起来的,没有对载流子分布函数进行任何形式的先验假设。该模型的一个基本特征是通过载流子能量弛豫时间考虑了能带结构对载流子产生速率的影响。为了验证模型的有效性,将其与著名的实证模型和分析模型进行了比较。与以往的能量依赖模型相反,本模型没有低估高场冲击电离的产生率。因此,它可以更好地预测半导体器件中的雪崩击穿电压和雪崩注入电流。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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