{"title":"Rule agnostic routing by using design fabrics","authors":"Gyuszi Suto","doi":"10.1145/2228360.2228443","DOIUrl":null,"url":null,"abstract":"Moore's law requires the shrinking of physical dimensions of the transistors to roughly half their area every two years. This poses a tremendous challenge on how to print and manufacture these ever-shrinking physical components that make up the transistors and the interconnect - generation after process generation. One aspect of this challenge is that the process rules are exploding in complexity - directly translating into physical design EDA (Electronic Design Automation) tool complexity. Traditional design rules governed the spacing, overlap or alignment of any two layout objects from this set: diffusion, poly, via cut, wire, etc. In this work we propose a solution that relies on grids (aka. Fabrics), models the design rules on those grids and presents them to the EDA tools in such a way that it minimizes the complexity cost on the tools' side. In an ideal situation, the proposed solution can completely decouple the tools from the process rules, i.e. even if the tools don't change at all, they'll still be able to support new process nodes.","PeriodicalId":263599,"journal":{"name":"DAC Design Automation Conference 2012","volume":"461 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-06-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"DAC Design Automation Conference 2012","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1145/2228360.2228443","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9
Abstract
Moore's law requires the shrinking of physical dimensions of the transistors to roughly half their area every two years. This poses a tremendous challenge on how to print and manufacture these ever-shrinking physical components that make up the transistors and the interconnect - generation after process generation. One aspect of this challenge is that the process rules are exploding in complexity - directly translating into physical design EDA (Electronic Design Automation) tool complexity. Traditional design rules governed the spacing, overlap or alignment of any two layout objects from this set: diffusion, poly, via cut, wire, etc. In this work we propose a solution that relies on grids (aka. Fabrics), models the design rules on those grids and presents them to the EDA tools in such a way that it minimizes the complexity cost on the tools' side. In an ideal situation, the proposed solution can completely decouple the tools from the process rules, i.e. even if the tools don't change at all, they'll still be able to support new process nodes.