150 V-Bias RF GaN for 1 kW UHF Radar Amplifiers

G. Formicone, J. Burger, J. Custer
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引用次数: 10

Abstract

A 1 kilowatt pulsed RF amplifier operating at 150 V for radar applications in the UHF frequency band from 420 MHz to 450 MHz is presented. GaN HEMT devices with 600 V breakdown voltage are becoming ubiquitous in power conversion applications operating from kHz to a few MHz, but they have never been considered for RF applications in power amplifiers. This paper explores the advantages in high power RF amplifiers that employ a high voltage GaN technology operating above the industry standard of 50 V. The signal is a pulse of 100 μs width and 10% duty cycle. The power amplifier is based on a specifically designed RF GaN technology that can operate at 150 V bias. The RF GaN transistor has breakdown voltage in excess of 500 V and peak iron (Fe) doping in the buffer layer in excess of 1018 cm-3. The single- ended 150 V RF GaN device utilizes three dice of 15 mm gate periphery assembled in a standard ceramic package. It achieves 1 kW output power across the band, with >70% drain efficiency without pulse gating during radar transmitter receive mode.
用于1kw UHF雷达放大器的150v偏置射频GaN
介绍了一种工作电压为150 V的1千瓦脉冲射频放大器,用于420 ~ 450 MHz的超高频雷达应用。具有600 V击穿电压的GaN HEMT器件在从kHz到几MHz的功率转换应用中变得无处不在,但它们从未被考虑用于功率放大器中的射频应用。本文探讨了采用高于50v工业标准的高压GaN技术的高功率射频放大器的优势。该信号为宽度为100 μs、占空比为10%的脉冲。该功率放大器基于专门设计的射频氮化镓技术,可在150v偏置下工作。RF GaN晶体管击穿电压超过500 V,缓冲层中铁(Fe)掺杂峰值超过1018 cm-3。单端150v射频GaN器件采用三个15毫米栅极外围的骰子组装在一个标准的陶瓷封装。在雷达发射机接收模式下,它实现了1 kW的全频段输出功率,在没有脉冲门控的情况下具有>70%的漏极效率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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