{"title":"150 V-Bias RF GaN for 1 kW UHF Radar Amplifiers","authors":"G. Formicone, J. Burger, J. Custer","doi":"10.1109/CSICS.2016.7751006","DOIUrl":null,"url":null,"abstract":"A 1 kilowatt pulsed RF amplifier operating at 150 V for radar applications in the UHF frequency band from 420 MHz to 450 MHz is presented. GaN HEMT devices with 600 V breakdown voltage are becoming ubiquitous in power conversion applications operating from kHz to a few MHz, but they have never been considered for RF applications in power amplifiers. This paper explores the advantages in high power RF amplifiers that employ a high voltage GaN technology operating above the industry standard of 50 V. The signal is a pulse of 100 μs width and 10% duty cycle. The power amplifier is based on a specifically designed RF GaN technology that can operate at 150 V bias. The RF GaN transistor has breakdown voltage in excess of 500 V and peak iron (Fe) doping in the buffer layer in excess of 1018 cm-3. The single- ended 150 V RF GaN device utilizes three dice of 15 mm gate periphery assembled in a standard ceramic package. It achieves 1 kW output power across the band, with >70% drain efficiency without pulse gating during radar transmitter receive mode.","PeriodicalId":183218,"journal":{"name":"2016 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","volume":"35 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSICS.2016.7751006","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 10
Abstract
A 1 kilowatt pulsed RF amplifier operating at 150 V for radar applications in the UHF frequency band from 420 MHz to 450 MHz is presented. GaN HEMT devices with 600 V breakdown voltage are becoming ubiquitous in power conversion applications operating from kHz to a few MHz, but they have never been considered for RF applications in power amplifiers. This paper explores the advantages in high power RF amplifiers that employ a high voltage GaN technology operating above the industry standard of 50 V. The signal is a pulse of 100 μs width and 10% duty cycle. The power amplifier is based on a specifically designed RF GaN technology that can operate at 150 V bias. The RF GaN transistor has breakdown voltage in excess of 500 V and peak iron (Fe) doping in the buffer layer in excess of 1018 cm-3. The single- ended 150 V RF GaN device utilizes three dice of 15 mm gate periphery assembled in a standard ceramic package. It achieves 1 kW output power across the band, with >70% drain efficiency without pulse gating during radar transmitter receive mode.