Effects related to dose deposition profiles in integrated optics structures

Proceedings of the Third European Conference on Radiation and its Effects on Components and Systems Pub Date : 1995-09-18 DOI:10.1109/RADECS.1995.509831

R. H. West, S. Dowling

引用次数: 1

Abstract

Results from exposures of lithium tantalate and lithium niobate integrated optic structures to pulses of high energy X-rays and fast electrons are related to dose and charge deposition profiles. Anomalous effects in the tantalate are ascribed to induced electric fields.

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集成光学结构中剂量沉积分布的相关效应

钽酸锂和铌酸锂集成光学结构在高能x射线和快电子脉冲下暴露的结果与剂量和电荷沉积谱有关。钽酸盐中的异常效应归因于感应电场。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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