Comparison of γ and β-ray irradiation effects in sol-gel Ge-doped SiO2

A. Alessi, S. Agnello, F. Gelardi, D. Sporea, C. Oproiu, B. Brichard
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Abstract

We report an experimental study on the comparison between the γ or β ray induced Ge related point defects in Ge doped silica. Silica samples doped with ∼2.2 1017 Ge atoms/cm3 produced with the sol-gel technique have been irradiated. The effects of the irradiation have been investigated by optical absorption, photoluminescence and electron paramagnetic resonance spectroscopy in order to evaluate the generation and the dependence on dose of the Ge(1), E'Ge, Germanium Lone Pair Center (GLPC) and H(II) point defects. No relevant differences between the concentrations of γ or β ray induced Ge(1) and E'Ge point defects have been observed. In addition, it is found that both irradiations are able to induce GLPC with the same dose dependence. The main difference regards the formation of H(II), that arise from the reaction of GLPC with H released by irradiation, their concentration being larger after γ irradiation. It is suggested that the larger efficiency of H(II) generation by γ ray is due to the specific mechanism involving H released by irradiation. At variance, for the other Ge-related defects, our data show that the same processes of formation of such centers are involved in γ or β ray irradiation.
溶胶-凝胶掺锗SiO2的γ射线和β射线辐照效应比较
本文报道了锗掺杂二氧化硅中γ射线和β射线诱导的锗相关点缺陷的比较实验研究。用溶胶-凝胶技术制备了掺杂~ 2.2 1017个Ge原子/cm3的二氧化硅样品。采用光吸收、光致发光和电子顺磁共振波谱等方法研究了辐照效应,探讨了锗(1)、锗(E’Ge)、锗孤对中心(GLPC)和H(II)点缺陷的产生及其对剂量的依赖性。γ射线或β射线诱导的Ge(1)和E'Ge点缺陷浓度之间没有相关差异。此外,我们发现两种照射均能诱导GLPC,且具有相同的剂量依赖性。主要区别在于γ辐照后GLPC与辐照释放的H反应生成H(II), γ辐照后H(II)的浓度更大。结果表明,γ射线产生H(II)的效率较高与辐照释放H的特定机制有关。相反,对于其他与ge相关的缺陷,我们的数据表明,这些中心的形成过程与γ或β射线辐照有关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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