FIB-SEM investigation and auto-metrology of polymer-microlens/CFA arrays of CMOS image sensor

Proceedings of the 21th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) Pub Date : 2014-09-18 DOI:10.1109/IPFA.2014.6898142

P. Sharma, Tai Shan Chiu, S. Biring, T. Chang, C. Chu, Y. Hsieh

引用次数: 1

Abstract

We report sample preparation and FIB-SEM investigation of polymer-microlens/CFA arrays of CMOS image sensor for investigating possible nanoscale voids. Polymer staining was employed to delineate boundaries of color filters and microlenses. Newly developed in-house auto-metrology software was used for dimension and uniformity study of SEM images of microlenses.

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CMOS图像传感器聚合物微透镜/CFA阵列的FIB-SEM研究与自动计量

我们报道了CMOS图像传感器的聚合物微透镜/CFA阵列的样品制备和FIB-SEM研究，以研究可能的纳米级空隙。聚合物染色用于描绘彩色滤光片和微透镜的边界。采用自主开发的自动测量软件对微透镜的扫描电镜图像进行了尺寸和均匀性研究。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Proceedings of the 21th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)

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