T. Komatsu, N. Okazaki, T. Nishihara, S. Kayama, N. Hoshi, J. Aaoyama, T. Shimada
{"title":"A 35ns 1Mb CMOS SRAM","authors":"T. Komatsu, N. Okazaki, T. Nishihara, S. Kayama, N. Hoshi, J. Aaoyama, T. Shimada","doi":"10.1109/ISSCC.1987.1157110","DOIUrl":null,"url":null,"abstract":"A 128×8b CMOS SRAM with TTL input/output levels will be presented. The SRAM has been fabricated in a 1.0μm double-poly silicon double-metal CMOS technology Chip size is 8×13.65mm. Typical standby current is 5μA with 100mW dissipatlon at 10MHz. Noise immunity has been achieved from a dual threshold level data transfer.","PeriodicalId":102932,"journal":{"name":"1987 IEEE International Solid-State Circuits Conference. Digest of Technical Papers","volume":"118 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1987 IEEE International Solid-State Circuits Conference. Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSCC.1987.1157110","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6
Abstract
A 128×8b CMOS SRAM with TTL input/output levels will be presented. The SRAM has been fabricated in a 1.0μm double-poly silicon double-metal CMOS technology Chip size is 8×13.65mm. Typical standby current is 5μA with 100mW dissipatlon at 10MHz. Noise immunity has been achieved from a dual threshold level data transfer.