Metal-semiconductor-metal (MSM) photodetectors based on single-walled carbon nanotube film-silicon Schottky contacts

SPIE MOEMS-MEMS Pub Date : 2008-02-07 DOI:10.1117/12.761935
A. Behnam, Jason L. Johnson, Yongho Choi, M. G. Ertosun, Zhuangchun Wu, A. Rinzler, P. Kapur, K. Saraswat, A. Ural
{"title":"Metal-semiconductor-metal (MSM) photodetectors based on single-walled carbon nanotube film-silicon Schottky contacts","authors":"A. Behnam, Jason L. Johnson, Yongho Choi, M. G. Ertosun, Zhuangchun Wu, A. Rinzler, P. Kapur, K. Saraswat, A. Ural","doi":"10.1117/12.761935","DOIUrl":null,"url":null,"abstract":"We fabricate and experimentally characterize metal-semiconductor-metal (MSM) photodetectors with CNT film Schottky electrodes on n-type and p-type silicon substrates. We extract a Schottky barrier height of ~0.45 eV and ~0.51 eV for CNT films on n-type and p-type Si respectively. The extracted barrier height corresponds to a CNT film workfunction of 4.5-4.7 eV, which is within the range of the previously reported workfunction values for individual CNTs. Furthermore, we find that while at temperatures above 240°K thermionic emission is the dominant transport mechanism, at lower temperatures tunneling begins to dominate. We also characterize the photoresponse of the CNT film-Si MSM photodetector by illuminating the samples with a 633 nm HeNe laser. We observe that while the photocurrent of the CNT film MSM devices is similar to that of the Ti/Au control samples at high biases, their lower dark current results in a higher photo-to-dark current ratio relative to the control devices. We explain these observations by comparing the two interfaces. This work opens up the possibility of integrating CNT films as transparent and conductive Schottky electrodes in conventional semiconductor electronic and optoelectronic devices.","PeriodicalId":130723,"journal":{"name":"SPIE MOEMS-MEMS","volume":"112 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-02-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"SPIE MOEMS-MEMS","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.761935","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

We fabricate and experimentally characterize metal-semiconductor-metal (MSM) photodetectors with CNT film Schottky electrodes on n-type and p-type silicon substrates. We extract a Schottky barrier height of ~0.45 eV and ~0.51 eV for CNT films on n-type and p-type Si respectively. The extracted barrier height corresponds to a CNT film workfunction of 4.5-4.7 eV, which is within the range of the previously reported workfunction values for individual CNTs. Furthermore, we find that while at temperatures above 240°K thermionic emission is the dominant transport mechanism, at lower temperatures tunneling begins to dominate. We also characterize the photoresponse of the CNT film-Si MSM photodetector by illuminating the samples with a 633 nm HeNe laser. We observe that while the photocurrent of the CNT film MSM devices is similar to that of the Ti/Au control samples at high biases, their lower dark current results in a higher photo-to-dark current ratio relative to the control devices. We explain these observations by comparing the two interfaces. This work opens up the possibility of integrating CNT films as transparent and conductive Schottky electrodes in conventional semiconductor electronic and optoelectronic devices.
基于单壁碳纳米管-硅肖特基触点的金属-半导体-金属(MSM)光电探测器
我们用碳纳米管薄膜肖特基电极在n型和p型硅衬底上制作并实验表征了金属-半导体-金属(MSM)光电探测器。我们在n型和p型Si上分别获得了~0.45 eV和~0.51 eV的肖特基势垒高度。所提取的势垒高度对应于碳纳米管薄膜的功函数为4.5-4.7 eV,在之前报道的单个碳纳米管的功函数范围内。此外,我们发现在240°K以上的温度下,热离子发射是主要的输运机制,而在较低的温度下,隧穿开始起主导作用。我们还通过633 nm的HeNe激光照射样品来表征碳纳米管薄膜- si MSM光电探测器的光响应。我们观察到,虽然碳纳米管薄膜MSM器件的光电流与高偏置下的Ti/Au对照样品相似,但相对于对照器件,它们较低的暗电流导致更高的光暗电流比。我们通过比较两个界面来解释这些观察结果。这项工作开辟了将碳纳米管薄膜作为透明导电肖特基电极集成到传统半导体电子和光电子器件中的可能性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信