GaAs 10 K gates gate array with digital variable delay macro cell

A. Ohta, N. Higashisaka, M. Shimada, T. Heima, K. Hosogi, R. Ohmura, N. Tanino
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引用次数: 2

Abstract

A GaAs 10 K gates gate array with digital variable delay macro cell is successfully developed for various measurement instrument applications. The digital delay circuit has 38.8 ns span and 50 ps resolution, and power dissipation is 300 mW, which is about half the dissipation for conventional analog delay circuits. It is possible for the gate array to include up to 8 delay macro cells with 800 gates. The gate array is fabricated using 0.5 /spl mu/m BPLDD (Buried p-layer Lightly Doped Drain) SAGFET (self-align gate metal FET) technology with triple metal layers. This chip is packed in a 132 pin ceramic QFP (quad flat package).
带有数字可变延迟宏单元的GaAs 10k门阵列
成功研制了一种具有数字可变延迟宏单元的GaAs 10k栅极门阵列,可用于各种测量仪器。数字延迟电路的跨度为38.8 ns,分辨率为50 ps,功耗为300 mW,约为传统模拟延迟电路的一半。门阵列可以包含多达8个具有800个门的延迟宏单元。栅极阵列采用0.5 /spl mu/m埋p层轻掺杂漏极(BPLDD) SAGFET(自校准栅极金属场效应管)三金属层技术制备。该芯片封装在一个132引脚陶瓷QFP(四平面封装)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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