245/243GHz, 9.2/10.5dBm Saturated Output Power, 4.6/2.8% PAE, and 28/26dB Gain Power Amplifiers in 65nm CMOS Adopting 2-and 4-way Power Combining

Byeonghun Yun, Dae-Woong Park, Kyung-Sik Choi, Ho-Jin Song, Sang-Gug Lee
{"title":"245/243GHz, 9.2/10.5dBm Saturated Output Power, 4.6/2.8% PAE, and 28/26dB Gain Power Amplifiers in 65nm CMOS Adopting 2-and 4-way Power Combining","authors":"Byeonghun Yun, Dae-Woong Park, Kyung-Sik Choi, Ho-Jin Song, Sang-Gug Lee","doi":"10.1109/A-SSCC53895.2021.9634180","DOIUrl":null,"url":null,"abstract":"Lately, sub-THz bands are drawing attention for high data-rate communications where the H-band (220-325GHz) is a strong candidate for the next generation (6G) wireless communication systems. In terms of the level of integration and cost, CMOS has been the most attractive technology for commercialization.","PeriodicalId":286139,"journal":{"name":"2021 IEEE Asian Solid-State Circuits Conference (A-SSCC)","volume":"32 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE Asian Solid-State Circuits Conference (A-SSCC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/A-SSCC53895.2021.9634180","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Lately, sub-THz bands are drawing attention for high data-rate communications where the H-band (220-325GHz) is a strong candidate for the next generation (6G) wireless communication systems. In terms of the level of integration and cost, CMOS has been the most attractive technology for commercialization.
245/243GHz, 9.2/10.5dBm饱和输出功率,4.6/2.8% PAE, 28/26dB增益的65nm CMOS功率放大器,采用2路和4路功率组合
最近,次太赫兹(sub-THz)频段在高数据速率通信中备受关注,其中h波段(220-325GHz)是下一代(6G)无线通信系统的有力候选。就集成水平和成本而言,CMOS一直是最具商业化吸引力的技术。
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