Copper thick-film substrates for power electronic applications

T. Blank, B. Leyrer, T. Maurer, M. Meisser, M. Bruns, M. Weber
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引用次数: 14

Abstract

Substrates for high power electronic systems are dominated by DCB-technology. Recently, new copper thick-film pastes have been proposed for use as high power substrates. They are compatible with Al2O3- and pre-oxised AlN-substrates. This paper investigates production processes to build up highly reliable power modules and explores basis electrical and thermal properties of thick-film copper substrates. Fired copper film thicknesses of 300 μm have been produced by subsequent print-dry-fire cycles. Smooth surfaces and copper films with a density of about 70 % of bulk copper have been produced. A power module comprising of 650 V IGBTs, diodes and an intelligent hall sensor with copper traces and spaces of 200 μm is presented. Wire bonding processes on copper thick-films with 500 μm aluminium wire and 400 μm copper wire are discussed. Test units with a 1200 V IGBT were built up. The IGBT was attached at 250 °C and a pressure of 15 MPa using a novel silver sinter paste. This paste can be directly used on copper. The current-carrying capacity of the thick-film test samples was found to be reduced by 10% in comparison to the DCB test device. No significant difference was found in the performance of both technologies in active power pulse tests lasting a few seconds. The number of cycles for test devices with sintered chips, bonded with 400 μm copper wire bonds exceeded 450,000 cycles in a cycles from 25 °C up to 150 °C.
电力电子用铜厚膜衬底
大功率电子系统的基板以dcb技术为主。最近,新的铜厚膜浆料被提出用于大功率衬底。它们与Al2O3-和预氧化aln -衬底相容。本文研究了高可靠性电源模块的生产工艺,并探讨了厚膜铜基板的基本电学和热学性能。通过后续的打印-干-火循环制备了厚度为300 μm的烧制铜膜。已生产出光滑的表面和密度约为散装铜70%的铜膜。提出了一种由650v igbt、二极管和智能霍尔传感器组成的功率模块,其铜线间距为200 μm。讨论了500 μm铝线和400 μm铜线在铜厚膜上的焊接工艺。装有1200伏IGBT的测试单元被建立起来。采用一种新型的银烧结浆料,在250℃和15 MPa的压力下对IGBT进行了吸附。这种浆料可以直接用在铜上。与DCB测试装置相比,厚膜测试样品的载流能力降低了10%。在持续数秒的有功脉冲试验中,两种技术的性能无显著差异。在25°C到150°C的循环中,使用400 μm铜线键合烧结芯片的测试设备的循环次数超过45万次。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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