Breakthrough of drain current capability and on-resistance limits by gate-connected superjunction MOSFET

W. Saito
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引用次数: 6

Abstract

This paper reports a new structure of Gate-connected Superjunction (GS) MOSFET to cope with both high drain current density and low on-resistance. The conventional superjunction (SJ) structure is attractive to reduce the specific on-resistance dramatically due to the charge compensation concept. The drain saturation current density, however, is limited by JFET depletion at the bottom region of the SJ structure even if the on-resistance can be reduced by the lateral SJ pitch narrowing. The accumulation-mode operation is effective not only for low on-resistance but also for suppressing the depletion at the SJ bottom due to the accumulation carriers. This paper reports the potential of the GS-MOSFET for high drain current density and low on-resistance based on the simulation results. Dynamic characteristics are also compared with the conventional SJ-MOSFET.
栅极连接超结MOSFET突破漏极电流能力和导通电阻限制
本文报道了一种门连接超结(GS) MOSFET的新结构,以应对高漏极电流密度和低导通电阻。由于电荷补偿的概念,传统的超结(SJ)结构具有显著降低导通电阻的吸引力。然而,漏极饱和电流密度受到SJ结构底部区域的JFET耗尽的限制,即使通过横向SJ节距缩小可以降低导通电阻。累加模式操作不仅对低导通电阻有效,而且对抑制由于累加载流子在SJ底部造成的损耗也有效。基于仿真结果,本文报道了GS-MOSFET具有高漏极电流密度和低导通电阻的潜力。并与传统SJ-MOSFET的动态特性进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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