H. Fukutome, S. Hasegawa, T. Okui, H. Nakashima, Takayuki Aoyama, Hiroshi Arimoto
{"title":"Scanning tunneling microscopy study of annealing effects on Si nanoscaled pn junctions formed by ion implantation","authors":"H. Fukutome, S. Hasegawa, T. Okui, H. Nakashima, Takayuki Aoyama, Hiroshi Arimoto","doi":"10.1109/IMNC.1999.797470","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"218 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.1999.797470","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}