H. Wakamatsu, M. Matsuki, N. Tanaka, H. Ogata, H. Iba, K. Murata
{"title":"High efficiency airborne molecular contaminants removal technology by a new cooled-type 2-stage high-speed air washer method","authors":"H. Wakamatsu, M. Matsuki, N. Tanaka, H. Ogata, H. Iba, K. Murata","doi":"10.1109/ISSM.2000.993670","DOIUrl":null,"url":null,"abstract":"We have developed a new cooled-type 2-stage high-speed air washer treating technique to remove the high-concentration airborne molecular contaminants (AMC) in the outside air. This technique was applied in an air-conditioning system to treat the intake air of the clean room. The new air conditioning system can treat the AMC to a sufficiently lower concentration, which does not influence a semiconductor manufacturing process. By a new B-factor analysis, the effectiveness of the 1st-stage of the cooling condensation coil was found and the chemical ion removal mechanism of the new system was solved. The new system can remove both chemical contaminants of the water-solube and water-insolube variety. This new system can operate at almost the same initial and running costs as the conventional air-conditioning system without chemical contaminant countermeasures.","PeriodicalId":104122,"journal":{"name":"Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)","volume":"40 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2000.993670","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
We have developed a new cooled-type 2-stage high-speed air washer treating technique to remove the high-concentration airborne molecular contaminants (AMC) in the outside air. This technique was applied in an air-conditioning system to treat the intake air of the clean room. The new air conditioning system can treat the AMC to a sufficiently lower concentration, which does not influence a semiconductor manufacturing process. By a new B-factor analysis, the effectiveness of the 1st-stage of the cooling condensation coil was found and the chemical ion removal mechanism of the new system was solved. The new system can remove both chemical contaminants of the water-solube and water-insolube variety. This new system can operate at almost the same initial and running costs as the conventional air-conditioning system without chemical contaminant countermeasures.