Mg Doping Effects on Optical and Electrical Properties of Solution-Processed ZnO Quantum Dots Based Thin Film Devices

Y. Kumar, H. Kumar, G. Rawat, B. Pal, S. Jit
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Abstract

The effects of Mg doping on the optical and electrical properties of solution-processed ZnO quantum dots (QDs) thin film has been analyzed. The thin film of ZnO QDs with different doping concentration of Mg (2% and 4%) are deposited over the glass substrate using solution processing. The effect of doping is evident on the bandgap of the material as the doped QDs shows blue shift in the absorption spectrum. Further, we have analyzed fabricated device of Mg-doped ZnO QD and calculated carrier concentration, Hall mobility, and sheet resistance. The values found to be 4.88x1014 cm-3, 4.92 cm2/VS, and 5.18x108 Ω/□ respectively for Mg (2%)-doped ZnO QDs and 5.39x1014 cm-3, 6.60 cm2/VS, and 5.56x108 Ω/□ respectively for Mg(4%)-doped ZnO QDs. The device with doping of 4% Mg shows the better electrical properties comparative to ZnO QDs with Mg doping of 2% and 0%. The transmittance curve of ZnO QDs shows the sharp cut-off for visible region with increase in doping percentage and Mg(4%)-doped ZnO shows ~90% transmittance across the visible region with sharp increase in 360nm. These characteristics of Mg-doped ZnO can be further utilized for photodetection application of short wavelengths.
Mg掺杂对溶液法制备ZnO量子点薄膜器件光电性能的影响
分析了Mg掺杂对溶液法制备ZnO量子点薄膜光学和电学性能的影响。采用溶液法制备了不同Mg掺杂浓度(2%和4%)的ZnO量子点薄膜。掺杂对材料带隙的影响是明显的,掺杂的量子点在吸收光谱中表现出蓝移。进一步,我们分析了制备的mg掺杂ZnO QD器件,并计算了载流子浓度、霍尔迁移率和片电阻。Mg(2%)掺杂ZnO量子点的值分别为4.88x1014 cm-3、4.92 cm2/VS和5.18x108 Ω/□;Mg(4%)掺杂ZnO量子点的值分别为5.39x1014 cm-3、6.60 cm2/VS和5.56x108 Ω/□。与掺杂2%和0% Mg的ZnO量子点相比,掺杂4% Mg的器件表现出更好的电学性能。ZnO量子点的透射率曲线显示,随着掺杂率的增加,可见光区的透射率急剧下降,Mg(4%)掺杂的ZnO在可见光区的透射率为~90%,在360nm处透射率急剧上升。镁掺杂ZnO的这些特性可以进一步用于短波长的光探测应用。
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